金属/SiOx 界面におけるアモルファス相形成 の変更点



#freeze
#author("2020-12-18T18:57:31+09:00","","")
*金属/シリコン酸化物界面におけるアモルファス相形成 [#d8c77487]


''REFERENCES''~
+%%%T. Nagase%%%, R. Yamashita, A. Yabuuchi, J.-G. Lee, AIP Advances, 5, 117145 1-7 (2015), "An amorphous phase formation at palladium / silicon oxide (Pd/SiOx) interface through electron irradiation - electronic excitation process", http://dx.doi.org/10.1063/1.4936629
+%%%T. Nagase%%%, R. Yamashita, J.-G. Lee, Journal of Applied Physics, 119, 165103 1-9 (2016)., "Electron irradiation induced crystallization at metallic amorphous / silicon oxide interfaces caused by electronic excitation", http://dx.doi.org/10.1063/1.4947519
+%%%T. Nagase%%%, R. Yamashita, J.-G. Lee, AMTC Letters, 5, 198-199 (2016), "In situ observation of the irradiation induced structural change at palladium/silicon oxide (Pd/SiOx) interfaces under electron irradiation focusing on the temperature dependence", http://amtc5.com/

トップ   編集 差分 バックアップ 添付 複製 名前変更 リロード   新規 一覧 検索 最終更新   ヘルプ   最終更新のRSS